C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 501/38 (2006.01) A61K 31/545 (2006.01) C07D 501/00 (2006.01) C07D 519/00 (2006.01)
Patent
CA 2057777
RAN 4410/228 Abstract Cephalosporin derivatives of the general formula Image in which R3 is a group of the formula Image (a) R60 and R65 are hydrogen or lower alkyl, R15-R19 are each independently hydrogen, halogen or hydroxy, n is zero or 1, R4 and R5 are each hydrogen, halogen, lower alkyl, lower alkoxy or amino, R7 is hydrogen or lower alkyl and R8 is lower alkyl, halo- lower alkyl, C3-C7 cycloalkyl or mono-, di- or trihalophenyl, and Z is N or C-R9, where R9 is hydrogen, halogen, lower alkyl or lower alkoxy; and, when R4 is fluoro, R5 and R7 are hydrogen, R8 is cyclopropyl and Z is C-H, R3 can also be one of the groups Image (b) Image (c) in which R61 and R66 are hydrogen or methyl, R15-R19 are as above and R90 is hydrogen, hydroxy, carboxy, amino or [[4- (lower alkyl)-2,3-dioxo-1-piperazinyl]carbonyl]amino; pharmaceutically acceptable acid or base addition salts thereof, hydrates of compounds of formula I and hydrates of such salts. The products have antibacterial activity.
Albrecht Harry A.
Keith Dennis D.
Wei Chung-Chen
Albrecht Harry A.
Gowling Lafleur Henderson Llp
Hoffmann-La Roche (f.) Ag
Keith Dennis D.
Wei Chung-Chen
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