C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 519/00 (2006.01) A61K 31/545 (2006.01) C07D 471/04 (2006.01) C07D 487/04 (2006.01) C07D 501/00 (2006.01) C07D 501/16 (2006.01)
Patent
CA 2083345
RAN 4410/231K Abstract Cephalosporin derivatives of the general formula Image wherein Z1 and Z2 each independently signify a 6-membered aromatic ring which is substituted by two vicinal -OR1 groups (wherein R1 represents hydrogen or lower alkanoyl), which can additionally contain a further 1 or 2 O or N atoms and/or which can be substituted by halogen, carboxy or carboxy-lower alkyl, or -X-Z1 and (Q)p Z2 each indepen- dently signify a group -X1-CONR2OH or -(Q1)p-CONR2OH, wherein R2 represents hydrogen, lower alkyl or phenyl; and wherein further A represents a nitrogen atom or a methine group (-CH=), X represents lower alkylene, phenylene or lower alkylene-phenylene, which is optionally substituted by carboxy and optionally linked via one of the groups -S-, -SO-, -SO2-, -CO-, -OCO-, -NHCO-, -NHSO2- and -CONHNHCO-, X1 represents lower alkylene, phenylene or lower alkylene- phenylene, Y represents one of the groups -O-, -OCO-, -OCH2-, -S-, -SCO-, -SO- and -SO2-, P represents a 5- or 6- membered N-monoheterocycle, which is optionally substituted by lower alkyl, phenyl, hydroxy or oxo, or an 8- to 10-membered N-biheterocycle, which is optionally substituted by lower alkyl, carboxy, lower alkoxycarbonyl, carbamoyl, hydroxymethyl or lower alkanoyloxymethyl, Q represents lower alkylene, phenylene or lower alkylene- phenylene, which is optionally linked via one of the groups -CO-, -OCO-, -SO2-, -NHCO- and -NHSO2-, or Q represents one of the groups -S-, -SO-, -SO2-, -CO-, -OCO-, -NHCO-, -NHSO2- and -CONHNEHCO-, Q1 represents lower alkylene, phenylene or lower alkylene-phenylene and m, n and p each represent the number 0 or 1; as well as readily hydrolyzable esters and pharmaceutically compatible salts of these compounds and hydrates of compounds of formula I and of their esters and salts as well as a process for their manufacture and pharmaceutical preparations which contain these compounds, further also intermediates for the manufacture of these compounds, furthermore the use of the compounds in the control of illnesses and for the manufacture of the aforementioned preparations.
Angehrn Peter
Furlenmeier Andre
Hebeisen Paul
Hofheinz Werner
Link Helmut
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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