C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/101
C07D 501/59 (2006.01) A61K 31/545 (2006.01) C07D 501/26 (2006.01)
Patent
CA 1306994
ABSTRACT OF THE DISCLOSURE A cephalosporin derivative having the formula: (I) Image wherein R1 is a substituted amino group, R2 is an aryl or heterocyclic group which may be substituted, R3 is a hydrogen atom, a negative charge or a residue of an ester which can form a pharmaceutically acceptable hydrolyzable in a living body and X is an alkylene group; or a pharmaceutically acceptable salt thereof, a process for its preparation and an antibacterial agent comprising thereof. The cephalosporin of this invention is useful in the pharmaceutical fields and, particularly, as antibacterial agents.
559943
Fukatsu Hiroshi
Katoh Yoshiaki
Murase Satoshi
Nakagawa Susumu
Banyu Pharmaceutical Co. Ltd.
Marks & Clerk
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