C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104.1
C07D 501/34 (2006.01) C07D 277/20 (2006.01)
Patent
CA 1171404
ABSTRACT: "CEPHALOSPORIN DERIVATIVES, THEIR PREPARATION AND COMPOSITIONS-CONTAINING THEM" Compounds of formula (I): Image ( I ) wherein: R1 represents a lower alkyl group selected from methyl groups and ethyl groups; R2 represents a hydrogen atom or a methyl group; and R3 represents a group selected from C1-C5 alkyl and C1-C5 alkoxy groups, and pharmaceutically acceptable acid addition salts thereof hava valuable antibiotic activity and are suitable for oral administration. They may be prepared by a variety of synthetic routes.
387048
Fujimoto Koichi
Igarashi Isamu
Ishihara Sadao
Nakao Hideo
Sugawara Shin'ichi
Marks & Clerk
Sankyo Company Limited
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