Cephalosporin derivatives, their production and use as...

C - Chemistry – Metallurgy – 07 – D

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260/104.1

C07D 501/20 (2006.01) C07D 231/12 (2006.01) C07D 231/14 (2006.01) C07D 231/18 (2006.01) C07D 231/38 (2006.01) C07D 231/40 (2006.01)

Patent

CA 1161032

NEW CEPHALOSPORIN DERIVATIVES AND THEIR PRODUCTION Abstract of the Disclosure: Novel compounds of formula I, Image in which R1 is hydrogen, alkyl, phenylalkyl, carb- alkoxyalkyl, acyl, carboxyalkyl, alkoxyalkyl, hydroxyalkyl, cyanoalkyl, or carbamoylalkyl, R2 is hydrogen, pivaloyloxymethyl or the residue of another easily splittable ester grouping, R3 is a pyrazolyl radical, unsubstituted or mono- or di-substituted by alkyl, phenyl, alkoxy, alkylthio, carboxy, carboxyalkyl, carbamoyl, carbamoylalkyl, alkylsulphonyl, azido, acylalmino, hydrazino, acylhydrazino, alkylidenehydrazino, furylidene-hydrazino, carbalkoxy or a group NH2, provided that the nitrogen atoms and the 4-position of the pyrazole nucleus are either unsubstituted or substituted by alkyl, phenyl, or carbalkoxy, and R4 is hydrogen, acetoxy, carbamoyloxy or -S-Rh, in which Rh is a heterocyclic radical.

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