C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/104
C07D 501/46 (2006.01) A61K 31/54 (2006.01) A61K 31/545 (2006.01) C07D 501/00 (2006.01) C07D 501/04 (2006.01) C07D 501/06 (2006.01) C07D 501/38 (2006.01) C07D 501/56 (2006.01) C07F 7/10 (2006.01)
Patent
CA 1338842
There are described cephem compounds of the formula: Image wherein R1 is amino or a protected amino, R is lower alkyl which may have one or more suitable substituent (s), R3 is COO?, carboxy or a protected carboxy , R4 is hydroxy (lower) alkyl or protected hydroxy (lower) alkyl, R5 is amino or a protected amino, R6 is hydrogen or lower alkyl, X? is an anion, and n is 0 or 1, with proviso that (i) when R3 is COO?, then n is 0, and (ii) when R3 is carboxy or a protected carboxy, then n is 1, and pharmaceutically acceptable salt thereof. The process of producing same as well as pharma- ceutical compositions containing hte cephem compounds are also described. These compounds are highly active against a number of pathogenic microorganisms.
577194
Inamoto Yoshiko
Kawabata Kohji
Miyai Kenzi
Sakane Kazuo
Fujisawa Pharmaceutical Co. Ltd.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
LandOfFree
Cephem compound and a process for preparation thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cephem compound and a process for preparation thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cephem compound and a process for preparation thereof will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1304662