C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/104
C07D 501/46 (2006.01) A61K 31/545 (2006.01)
Patent
CA 2011695
ABSTRACT Cephem compounds of the formula: Image wherein R1 is amino or a protected amino, R2 is ethyl, propyl or lower alkenyl, R3 is COO ? , carboxy or a protected carboxy, R4 is hydroxy(lower)alkyl or protected hydroxy(lower)alkyl, R5 is amino or a protected amino, X ? is an anion, and n is 0 or 1, or, R1, R3, R5, X ? and n are each as defined above, R2 is lower alkyl, and R4 is 3-hydroxypropyl, with proviso that (i) when R3 is COO ? , then n is 0, and (ii) when R3 is carboxy or a protected carboxy, then n is 1, or pharmaceutically acceptable salts thereof. The preparation of these compounds, pharmaceutical compositions containing then and a method of treating infectious diseases in humans and animals infected by pathogenic microorganisms are also disclosed.
Inamoto Yoshiko
Kawabata Kohji
Miyai Kenzi
Sakane Kazuo
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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