C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 501/24 (2006.01) C07D 501/22 (2006.01) C12Q 1/34 (2006.01) G01N 21/77 (2006.01) G01N 31/22 (2006.01) G01N 33/569 (2006.01) G01N 21/78 (2006.01)
Patent
CA 2423328
A cephem compound or pharmaceutically acceptable salt thereof represented by the formula I: (see formula I) wherein R1 and R2 may be the same or different and each represent hydrogen atom, nitro or cyano; R3 represents C1--C6 alkyl which may be substituted with carboxyl; R4 represents hydrogen atom or amino; X represents -S- or -SO-, there being no case where both of R1 and R2 are simultaneously hydrogen atom.
L'invention concerne des composés céphèmes correspondant à la formule générale (I), ou des sels de ceux-ci, acceptables sur le plan pharmacologique. Dans cette formule R1 et R2 représentent chacun indépendamment hydrogène, nitro ou cyano, R3 représente alkyle C1-6 éventuellement carboxylé, R4 représente hydrogène ou amino et X représente -S- ou -SO- à condition que R1 et R2 ne représentent pas simultanément hydrogène.
Hanaki Hideaki
Harada Hidenori
Hiramatsu Keiichi
Kawashima Seiichiro
Yamazaki Hiroaki
Fetherstonhaugh & Co.
Zenyaku Kogyo Kabushiki Kaisha
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