C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/104
C07D 501/34 (2006.01) A61K 31/545 (2006.01)
Patent
CA 1237427
ABSTRACT OF THE DISCLOSURE A cephem compound represent by the general formula Image wherein, R1 represents hydrogen or lower alkyl, R2 and R3 are the same or different and each represents hydrogen or lower alkyl, R4 represents carboxyl or esterified carboxyl, and n represents 0 or 1, a salt of the cephem compound, and a process for producing the cephem compound or a salt thereof. Compounds of the above formula and salts thereof are valuable as antibacterial agents and are especially useful as oral drugs in the prevention or treatment of bacterial infectious diseases.
470592
Fukasawa Masatomo
Fukumura Masataka
Kato Masuhiro
Masai Naruhito
Okuda Takao
Fetherstonhaugh & Co.
Sumitomo Pharmaceuticals Company Limited
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