C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/104
C07D 501/46 (2006.01) A61K 31/545 (2006.01) C07D 501/38 (2006.01)
Patent
CA 1289555
Cephem Compounds Abstracts of the disclosures Cephem compounds of the formula: Image wherein Q stands for a nitrogen atom or CH, R1 stands for a hydrogen atom or an optionally substituted lower alkyl group, R2 stands for a hydrogen atom or a lower alkyl group, A stands for a sulfur atom or NH, and n denotes an integral number ranging from 2 to 4, or salts thereof, and processes for producing them. The compounds (I) or salts thereof show not only excellent antibacterial activities against a wide range of pathogenic bacteria from gram-positive to gram- negative ones, including a variety of strains isolated clinically but also hydrophilic properties, and therefore they are excellent antibiotic substances having desirable water-solubility when used as injections.
544744
Kishimoto Shoji
Sendai Michiyuki
Tomimatsu Kiminori
Fetherstonhaugh & Co.
Kishimoto Shoji
Sendai Michiyuki
Takeda Chemical Industries Ltd.
Tomimatsu Kiminori
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