C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 501/46 (2006.01) A61K 31/545 (2006.01) C07D 285/08 (2006.01) C07D 501/00 (2006.01) C07D 519/00 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2070616
ABSTRACT OF THE DISCLOSURE There is described a compound of the formula: Image wherein R1 is amino or protected amino, R2 is lower alkyl substituted with 1 to 6 halogen, R3 is hydroxy(lower)alkyl, protected hydroxy(lower)alkyl or halo(lower)- alkyl and R4 is hydrogen, or R3 and R4 are linked together to form lower alkylene, and R5 is hydrogen or an amino protective group, and a pharmaceutically acceptable salt thereof. Pharma- ceutical compositions containing these compounds, the treatment of infectious diseases using these compo- sitions and the preparation of the compounds are also disclosed. These compounds are particularly useful in that they exhibit high antimicrobial activity, by inhibiting the growth of a wide variety of pathogenic microorganisms including Gram-positive and Gram- negative microorganisms and are therefore useful as antimicrobial agents.
Eikyu Yoshiteru
Kawabata Kohji
Ogawa Yasuhiro
Okuda Shinya
Sakane Kazuo
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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