C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/104
C07D 501/46 (2006.01) A61K 31/425 (2006.01) A61K 31/545 (2006.01) C07D 501/00 (2006.01) C07D 501/04 (2006.01) C07D 501/06 (2006.01) C07D 501/18 (2006.01) C07D 501/38 (2006.01) C07D 501/56 (2006.01)
Patent
CA 1293719
ABSTRACT Compound of the formula: Image wherein R1 and R4 are each amino or a protected amino group, R2 is carboxy(lower)alkyl or a protected carboxy(lower)alkyl, R3 is lower alkyl, hydroxy(lower)alkyl or a protected hydroxy(lower)alkyl, and R5 is hydrogen or lower alkyl, and pharma- ceutically acceptable salts thereof. The preparation of these compounds is also disclosed. These compounds are highly active against a number of pathogenic microorganisms.
545415
Kawabata Kohji
Miyai Kenzi
Sakane Kazuo
Takaya Takao
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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