C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/308.3
C07D 285/08 (2006.01)
Patent
CA 1175843
ABSTRACT Compounds of the formula: Image (IA) wherein R1 is amino or a protected amino and R2 is lower alkyl, or a salt thereof, are useful as intermediates for the preparation of 7-substituted-3-cephem-4-carboxylic acids and their pharmaceu- tically acceptable salts; the cephem campounds have antimicrobial activity and may be used in the prophylactic and therapeutic treatment of infectious diseases in human beings and animals.
438260
Goto Jiro
Sakane Kazuo
Teraji Tsutomu
Fujisawa Pharmaceutical Co. Ltd.
Marcoux & Sher Swabey Mitchell Houle
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