C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104.1
C07D 501/46 (2006.01) C07C 17/26 (2006.01) C07D 209/48 (2006.01) C07D 257/04 (2006.01) C07D 285/08 (2006.01) C07D 295/21 (2006.01)
Patent
CA 1215969
ABSTRACT OF THE DISCLOSURE New cephem compounds and their process of preparation are provided of the formula: Image wherein R1 is amino or a protected amino group; R2 is hydrogen, lower alkyl which may be substituted with suitable substitutent(s), lower alkenyl, lower alkynyl, cyclo(lower)- alkyl, cyclo(lower)alkenyl, or O containing 5-membered heterocyclic group substituted with oxo group(s); R3 is a group of the formula: Image wherein X is hydrogen or carbamoyl; and R4 is -COO-; or R3 is 2-lower alkyl-5-oxo-6-hydroxy-2,5-dihydro-1,2,4- triazinylthio; and R4 is carboxy or protected carboxy, and pharmaceutically acceptable salts thereof; the compounds are active against a number of pathogenic micro organisms including Gram-positive and Gram-negative bacteria.
361999
Goto Jiro
Sakane Kazuo
Teraji Tsutomu
Fujisawa Pharmaceutical Co. Ltd.
Marcoux & Sher Swabey Mitchell Houle
LandOfFree
Cephem compounds and processes for preparation thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cephem compounds and processes for preparation thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cephem compounds and processes for preparation thereof will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1315650