C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/108, 167/187
C07D 519/00 (2006.01) A61K 31/545 (2006.01) C07D 501/00 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2029638
ABSTRACT Compounds of the formula: Image wherein R1 is amino or a protected amino group, R2 is hydrogen or an organic group, R3 is hydrogen, lower alkyl, hydroxy(lower)alkyl, protected hydroxy(lower)alkyl, arnino(lower)alkyl, protected amino(lower)alkyl, carbamoyl(lower)alkyl, N,N-di(lower)alkylcarbamoyl(lower)alkyl or an imino protective group, R4 is hydrogen, lower alkyl, carboxy, protected carboxy, amino, protected amino or carbamoyl, and Z is N or CH, and a pharmaceutically acceptable salt thereof. These compounds exhibit high antimicrobial activity and inhibit the growth of a wide variety of pathogenic microorganisms including Gram-positive and Gram-negative microorganisms. They are use- ful as antimicrobial agents. They are useful for treating infectious diseases caused by pathogenic microorganisms. The preparation of these compounds, pharmaceutical compositions containing them, and medical treatment with these compositions are also disclosed.
Inamoto Yoshiko
Kawabata Kohji
Sakane Kazuo
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
LandOfFree
Cephem compounds and processes for preparation thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cephem compounds and processes for preparation thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cephem compounds and processes for preparation thereof will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1619046