C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/102, 260/106
C07D 501/28 (2006.01) C12P 35/06 (2006.01) C12P 35/08 (2006.01)
Patent
CA 1247029
CEPHEM COMPOUNDS AND THEIR PRODUCTION Abstract of the Disclosure A compound of the formula: Image wherein R1 stands for hydrogen or formylamino, R2 is a residue of amino acid or peptide selected from the group consisting of serine and alanine or hydrogen, R3 stands for -NH-C(=NH)-NH2 or -CH2NH2, or its salt, which can be produced by cultivating a microorganism belonging to the genus Xanthomonas, is useful as a therapeutic agent against infectious disease caused by bacteria.
470121
Harada Setsuo
Nozaki Yukimasa
Ono Hideo
Fetherstonhaugh & Co.
Takeda Pharmaceutical Company Limited
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