C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/102, 260/106
C07D 501/08 (2006.01) A61K 31/545 (2006.01) C12P 35/08 (2006.01)
Patent
CA 1297056
CEPHEM COMPOUNDS AND THEIR PRODUCTION Abstract of the Disclosure A compound of the formula: Image Image or wherein R1 is hydrogen, or a salt thereof, is useful as an intermediate for the production of cephem compounds, and some of them are useful as antimicrobial agent.
470115
Harada Setsuo
Ono Hideo
Tsubotani Shigetoshi
Fetherstonhaugh & Co.
Harada Setsuo
Ono Hideo
Takeda Chemical Industries Ltd.
Tsubotani Shigetoshi
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