Cephem compounds, processes for preparation thereof and...

Details Cephem compounds, processes for preparation thereof and... Cephem compounds, processes for preparation thereof and...

C - Chemistry, Metallurgy

07

D

260/101.5

C07D 501/59 (2006.01) A61K 31/545 (2006.01) C07D 501/20 (2006.01) C07D 501/34 (2006.01) C07D 501/46 (2006.01)

Patent

CA 1176240

ABSTRACT OF THE DISCLOSURE New compounds of the formula: Image wherein R1 is amino or protected amino, R2 is carboxy(lower)- alkyl or portected carboxy(lower)alkyl, R3 is halogen or lower alkoxy, and R4 is carboxy or protected carboxy, and pharmaceutically acceptable salts thereof are active against a number of pathogenic-microorganisms and can be used as antimicrobial agents.

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