C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 501/56 (2006.01) A61K 31/545 (2006.01) A61K 31/695 (2006.01) C07D 501/00 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2100623
Cephem Compounds, Their Production and Use Abstract of the Disclosure Novel cephem compounds having, at the 3-position of the cephem nucleus, a group of the formula: -CH2-S-A-Y-B wherein A stands for a further optionally substituted divalent nonionic aromatic heterocyclic group bounded to the adjacent sulfur atom via carbon atom, Y stands for a bond or S, O, NH, CONH, SO2NH or a divalent C1-C6 hydrocarbon chain optionally including one or two interrupting members selected from the group consisting of S, O, NH, CONH and SO2NH in the chain, and B stands for a group of the formula: Image or Image wherein R3 stands for H or an optionally substituted lower alkyl, R4 and R4 each stand for H, OH, an optionally substituted lower alkyl, COOH or CONH2, or salts thereof, having excellent antibacterial activities especially against Pseudomonas aeruainosa and keeping effective serum levels over a long period.
Okonogi Kenji
Sendai Michiyuki
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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