C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104, 167/187
C07D 501/18 (2006.01) A61K 31/545 (2006.01) C07D 277/22 (2006.01) C07D 279/08 (2006.01) C07D 285/04 (2006.01) C07D 417/14 (2006.01) C07D 501/36 (2006.01)
Patent
CA 1271741
ABSTRACT OF THE DISCLOSURE A cephem derivative represented by the general formula Image wherein R1 represents hydrogen or methyl, R2 represents carboxyl or esterified carboxyl, and n represents 0 or 1, or a pharmaceutically acceptable salt thereof; intermediates for the cephem derivative or salt thereof; processes for producing these compounds; and a pharma- ceutical composition and method for preventing or treating bacterial infectious diseases, wherein the cephem derivative or the salt thereof is used.
488312
Fukasawa Masatomo
Fukumura Masataka
Kato Masuhiro
Masai Naruhito
Okuda Takao
Fukasawa Masatomo
Fukumura Masataka
Kato Masuhiro
Marks & Clerk
Masai Naruhito
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