Cephem derivatives and processes for their manufacture

Details Cephem derivatives and processes for their manufacture Cephem derivatives and processes for their manufacture

C - Chemistry, Metallurgy

07

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167/187, 260/104

C07D 501/36 (2006.01) A61K 31/435 (2006.01) A61K 31/505 (2006.01) A61K 31/535 (2006.01) A61K 31/545 (2006.01) C07D 277/20 (2006.01) C07D 277/40 (2006.01) C07D 277/42 (2006.01) C07D 277/50 (2006.01) C07D 463/00 (2006.01) C07D 471/04 (2006.01) C07D 487/04 (2006.01) C07D 498/04 (2006.01) C07D 501/46 (2006.01) C07D 505/00 (2006.01)

Patent

CA 1259606

CEPHEM DERIVATIVES AND PROCESSES FOR THEIR MANUFACTURE Abstract of the disclosure: Cephem derivatives of the general formula Image in which R1 denotes hydrogen, an optionally substituted alkyl, acyl, arylsulfonyl, or alkylsulfonyl group or an amino-protec- tive group, R2 denotes hydrogen or an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, aralkyl, acyl, aryl, aryl- sulfonyl, alkylsulfonyl or heterocyclic group, R3 denotes hydro- gen, an ester group or a cation, R4 denotes hydrogen, a lower alkoxy group or a group which can be converted to this, X de- notes sulfur, oxygen or -CH2- and -NH- and A denotes hydrogen, an optionally substituted alkoxy or alkenyloxy group, halogen or a group -CH2Y, in which Y represents hydrogen, halogen or the radical of a nucleophilic compound, and in which the R2O group is in th syn-position.

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