C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/474, 260/541
C07C 317/24 (2006.01) A01N 35/06 (2006.01) A01N 41/10 (2006.01) C07C 45/54 (2006.01) C07C 323/65 (2006.01)
Patent
CA 1321795
PR-8247/8357 CERTAIN 2-(2-SUBSTITUTED BENZOYL)-4-(SUBSTITUTED OXY OR SUBSTITUTED THIO)-1,3-CYCLOHEXANEDIONES Abstract of the Disclosure Compounds of the formula Image wherein X is oxy, thio, sulfinyl or sulfonyl; R is halogen; C1-C2 alkyl; C1-C2 alkoxy; trifluoromethoxy; difluoromethoxy; nitro; cyano; C1-C2 haloalkyl; RaSOn- wherein n is 0 or 2 and Ra is C1-C2 alkyl, trifluoromethyl or difluoromethyl; R1 is hydrogen, C1-C4 alkyl, phenyl or substituted phenyl; R2 is hydrogen or C1-C4 alkyl; or R1 and R2 together are C2-C5 alkylene; R3 is hydrogen, C1-C4 alkyl, phenyl or substituted phenyl with the proviso that R1 and R3 are not both phenyl or substituted phenyl; R4 is hydrogen or C1-C4 alkyl; R5 is hydrogen or C1-C4 alkyl; R6 is hydrogen, C1-C4 alkyl, C1-C4 haloalkyl, or phenyl; R7 and R8 independently are (1) hydrogen; (2) halogen; (3) C1-C4 alkyl; (4) C1-C4 alkoxy; (5) trifluoromethoxy; (6) cyano; (7) nitro; (8) C1-C4 haloalkyl: (9) RbSOn- wherein n is the integer 0, 1 or 2: and Rb is (a) C1-C4 alkyl; (b) C1-C4 alkyl substituted with halogen or cyano; (c) phenyl; or (d) benzyl; (10) -NRcRd wherein Rc and Rd independently are hydrogen or C1-C4 alkyl; (11) ReC(O)- wherein Re is C1-C4 alkyl or C1-C4 alkoxy; or (12) -SO2NRcRd wherein Rc and Rd are as defined; and (13) -N(Rc)C(O)Rd wherein Rc and Rd are as defined; and their salts.
549327
Marks & Clerk
Zeneca Ag Products Inc.
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