C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 229/42 (2006.01) A61K 31/195 (2006.01)
Patent
CA 2298033
Disclosed are the compounds of formula (I), wherein R is methyl or ethyl; R1 is chloro or fluoro; R2 is hydrogen or fluoro; R3 is hydrogen, fluoro, chloro, methyl, ethyl, methoxy, ethoxy or hydroxy; R4 is hydrogen or fluoro; and R5 is chloro, fluoro, trifluoromethyl or methyl; pharmaceutically acceptable salts thereof; and pharmaceutically acceptable prodrug esters thereof; as selective COX-2 cyclooxygenase inhibitors.
L'invention concerne les composés représentés par la formule (I) dans laquelle R représente méthyle ou éthyle; R1 représente chloro ou fluoro; R2 représente hydrogène ou fluoro; R3 représente hydrogène, fluoro, chloro, méthyle, éthyle, méthoxy, éthoxy ou hydroxy; R4 représente hydrogène ou fluoro; R5 représente chloro, fluoro, trifluorométhyle ou méthyle; leurs sels acceptables sur le plan pharmaceutique; leurs esters de promédicaments acceptables sur le plan pharmaceutique; en tant qu'inhibiteurs sélectifs de COX-2-cyclooxygénase.
Fujimoto Roger Aki
Mcquire Leslie Wighton
Mugrage Benjamin Biro
Van Duzer John Henry
Xu Daqiang
Fetherstonhaugh & Co.
Novartis Ag
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