C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/14 (2006.01) C07D 487/14 (2006.01)
Patent
CA 2084288
ABSTRACT OF THE DISCLOSURE The invention encompasses compounds of the formula: Image and the phamaceutically acceptable non-toxic salts thereof wherein n is 0, 1, or 2, X is -N=?-R3 or -NR4-?=T. Z is H2, oxygen or sulfur, and R1, R2, R3, R4, T, W, and Y are defined variables. These compounds are highly selective agonists or inverse agonists for the GABAa brain receptors and are useful in the diagnosis and treatment of anxiety, sleep, and seizure disorders, overdose with benzodiazepine type drugs, and enhancement of alertness.
Albaugh Pamela
Moffat & Co.
Neurogen Corporation
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