C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/291, 260/458
C07F 9/173 (2006.01) A01N 57/02 (2006.01) C07F 9/165 (2006.01) C07F 9/40 (2006.01)
Patent
CA 1084053
Abstract of the Disclosure Compounds having the formula Image in which R1 is lower alkyl or lower alkoxy, R2 is lower alkoxy or methylthio-substituted lower alkoxy, and R3 is Image Image , or Image , R4 and R5 are lower alkyl, m is 1 or 2 and n is 0 or an integer from 1 to 4. The compounds have utility as insecticides and acaricides.
271377
Lam Hsiao-Ling
Teach Eugene G.
Gowling Lafleur Henderson Llp
Stauffer Chemical Company
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