Charge-coupled device and method of manufacturing the same

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356/197, 352/82.

H01L 21/28 (2006.01) H01L 21/339 (2006.01) H01L 29/423 (2006.01)

Patent

CA 1267975

ABSTRACT: "Charge-coupled semiconductor device and method of manufacturing the same". A charge-coupled semiconductor device having a plurality of silicon electrodes (1, 3, 5, 7, 9) for storing and transporting information-carrying charge, which electrodes are located on an insulating layer (21) and are mutually separated by grooves having a width of at most l/um. According to the invention, transfer electrodes (2, 4, 6, 8, 10) are arranged in the grooves, these electrodes being coplanar to the remaining electrodes (1, 3, 5, 7, 9). The thickness of the insulating layer under the transfer electrodes is substantially equal to that under the storage electrodes. The invention also relates to a method of manufacturing a semiconductor device having such an electrode system.

508666

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Charge-coupled device and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charge-coupled device and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charge-coupled device and method of manufacturing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1185444

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.