Charged particle beam illumination of blanking aperture array

H - Electricity – 01 – J

Patent

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H01J 37/317 (2006.01)

Patent

CA 2296583

A charged particle beam column (100) efficiently illuminates a blanking aperture array (108) by splitting a charged particle beam (110) into multiple charged particle beams and focusing each charge particle beam on a separate aperture of the blanking aperture array (108). Where an electron source with a small effective source size is used, for example an electron field emission source or Schottky source, crossovers of the individual beams may occur within the separate apertures of the blanking aperture array. Consequently, no demagnification of the beams passing through the blanking aperture array is necessary to form a small exposure pixel on the writing plane. A beam splitter, shown as biprism (104) is aligned perpendicularly to optical axis (A) and splits electron beam (110) into separate beamlets.

Selon cette invention, une colonne (100) de faisceaux de particules chargées éclaire efficacement une matrice (108) à orifices de suppression en divisant un faisceau (110) de particules chargées en plusieurs faisceaux et en focalisant chacun de ces faisceaux sur un orifice distinct de la matrice (108). Lors de l'utilisation d'une source d'électrons de petite taille telle qu'une source d'électrons à émission de champ ou source Schottky, des croisements de faisceaux individuels peuvent se produire dans les orifices distincts de la matrice. En conséquence, il n'est pas nécessaire de réduire les faisceaux traversant la matrice à orifices de suppression pour obtenir un petit pixel d'exposition sur le plan d'enregistrement. Un diviseur de faisceaux tel qu'un biprisme (104) est aligné perpendiculairement à l'axe (A) optique et divise le faisceau (110) d'électrons en petits faisceaux séparés.

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