Charged-particle-beam lithography

Details Charged-particle-beam lithography Charged-particle-beam lithography

H - Electricity

01

J

356/147, 356/192

H01J 37/317 (2006.01) H01J 37/30 (2006.01)

Patent

CA 1238121

- 22 - CHARGED-PARTICLE-BEAM LITHOGRAPHY Abstract An elongated source of charged particles is utilized in a lithographic system to form multiple focused electron (or ion) beams arranged in a linear array. The basis for an extremely high-throughput lithographic system especially suited for direct writing applications is thereby provided.

518996

Affiliated with

Also associated with

Rating

Charged-particle-beam lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged-particle-beam lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged-particle-beam lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1324854