Charged particle source

Details Charged particle source Charged particle source

H - Electricity

01

J

H01J 27/16 (2006.01)

Patent

CA 2271688

A charged particle source (100) applicable for etching, thin film deposition, or surface modification including a conductive electrode (129) for controlling the plasma potential and beam voltage, the electrode (129) retaining long term conductivity during operation, such as by shielding or in situ cleaning during operation, and/or by being operated in pulse mode conditions capable of preventing charge accumulation in the source during ion extraction.

Une source (100) de particules chargées, pouvant être utilisée pour la gravure, le dépôt en couches minces ou la modification de surface, comprend une électrode conductrice (129) qui permet de commander le potentiel du plasma et la tension du faisceau. L'électrode (129) conserve une conductivité à long terme durant le fonctionnement, par un blindage ou un nettoyage in situ durant le fonctionnement, par exemple, et/ou par un fonctionnement dans des conditions de mode pulsé capables d'empêcher l'accumulation de charges dans la source durant l'extraction des ions.

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