Charging guard with paschen stacking

G - Physics – 02 – B

Patent

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G02B 26/00 (2006.01) B81B 7/02 (2006.01)

Patent

CA 2668956

A MEMS-based mirror is provided with trenches between adjacent electrodes in order to be able to withstand relatively high applied voltages, and thus has a substantially reduced exposure to uncontrolled surface potentials. The MEMS-based mirror, thus avoids voltage drifts and has an improved mirror position stability. The trench dimensions are selected such that the voltage applied between each adjacent pair of electrodes stays within predefined limits. An insulating layer, such as silicon dioxide, electrically isolates each pair of adjacent electrodes. Each insulting layer extends partially above an associated trench and is characterized by the same height and width dimensions.

La présente invention concerne un miroir à base MEMS qui est pourvu de tranchées entre des électrodes adjacentes afin de pouvoir supporter des tensions appliquées relativement élevées, et ainsi présente une exposition sensiblement réduite à des potentiels de surface non contrôlés. Le miroir à base de MEMS évite ainsi des dérives de tension et possède une stabilité de position de miroir optimisée. Les dimensions de tranchées sont sélectionnées de sorte que la tension appliquée entre chaque paire adjacente d'électrodes reste au sein de limites prédéfinies. Une couche isolante, telle que du dioxyde de silicium, isole électriquement chaque paire d'électrodes adjacentes. Chaque couche isolante s'étend partiellement au-dessus d'une tranchée associée et est caractérisée par des dimensions identiques de hauteur et de largeur.

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