Chemical cleaning solution and method

Details Chemical cleaning solution and method Chemical cleaning solution and method

C - Chemistry, Metallurgy

23

F

149/14

C23F 1/16 (2006.01) C11D 3/39 (2006.01) C11D 7/26 (2006.01) G03D 13/02 (2006.01)

Patent

CA 1282304

ABSTRACT OF THE DISCLOSURE A chemical cleaning composition consisting essentially of water, a hydroxycarboxylic acid and a peroxymonosulfate compound is useful for cleaning processing tanks used in silver halide based photographic processing systems.

532164

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