Chemical etching composition for the preparation of 3-d...

Details Chemical etching composition for the preparation of 3-d... Chemical etching composition for the preparation of 3-d...

C - Chemistry, Metallurgy

07

C

C07C 217/58 (2006.01) C03C 4/00 (2006.01) C07C 211/31 (2006.01)

Patent

CA 2607781

The present invention is directed to the use of a chemical compound as an etchant for the removal of the unmodified areas of a chalcogenide-based glass, while leaving the image wise modified areas un-removed, whereby said compound contains a secondary amine, R1 R2 NH, with R, and/or R2 having a sterically bulky group with more than 5 atoms.

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