Chemical vapor deposition

Details Chemical vapor deposition Chemical vapor deposition

C - Chemistry, Metallurgy

23

C

117/83

C23C 16/18 (2006.01)

Patent

CA 1087040

Abstract of the Disclosure A process for chemical vapor deposition of ruthenium on heat resistant substrates employing ru- thenium 1, 3 dione compounds as volatile sources and causing the volatile material to impact on a heated receiving substrate in random fashion in a quiescent, low-pressure atmosphere.

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