Chemical vapor deposition apparatus

Details Chemical vapor deposition apparatus Chemical vapor deposition apparatus

C - Chemistry, Metallurgy

23

C

32/23, 32/24

C23C 16/52 (2006.01) C23C 16/48 (2006.01)

Patent

CA 1216419

Abstract of the Invention An improved chemical vapor deposition device having heating means substantially surrounding an inner deposi- tion chamber for providing isothermal or precisely con- trolled gradient temperature conditions therein. The internal components of the chamber are quartz or similar radiant energy transparent material. Also included are special cooling means to protect thermally sensitive seals, structural configurations strengthening areas of glass components subjected to severe stress during operation, and specific designs permitting easy removal and replacement of all glass components exposed to deposi- tion gas. -20-

462110

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