Chemical vapor deposition apparatus

Details Chemical vapor deposition apparatus Chemical vapor deposition apparatus

C - Chemistry, Metallurgy

23

C

32/23

C23C 16/52 (2006.01)

Patent

CA 1236970

Abstract of the Invention Chemical vapor deposition reaction chamber glassware includes an upper reaction chamber cover and a wafer boat support plate. A gas collector means has an upper edge supporting the wafer boat support, and the upper portion thereof communicates with gas flow openings in the wafer support plate for removal of spent CVD gases from the reaction chamber. Gas injectors enclosed within the gas collectors pass upwardly through the wafer support plate. Unique wafer boats of several types are supported on the wafer boat support.

515262

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