Chemical vapor deposition apparatus and method

Details Chemical vapor deposition apparatus and method Chemical vapor deposition apparatus and method

C - Chemistry, Metallurgy

23

C

C23C 16/44 (2006.01) C23C 16/02 (2006.01) C23C 16/448 (2006.01) C23C 16/455 (2006.01) C23C 16/54 (2006.01)

Patent

CA 2402040

Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of a coating chamber.

L'invention concerne une méthode et un appareil de dépôt de produits chimiques à l'état de vapeur; elle comprend des systèmes de répartition et d'évacuation de substances de revêtement à l'état gazeux, qui assurent une température et une répartition plus uniformes de ces gaz de revêtement le long d'une série de zones de revêtement distinctes, disposées le long d'une chambre de revêtement.

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