C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/54 (2006.01) C23C 16/00 (2006.01) H01L 21/203 (2006.01)
Patent
CA 2571993
A chemical vapor deposition apparatus (10) comprises a heating element (12) capable of emitting electromagnetic radiation; a retort (16) positioned relative to the heating element (12) to receive the electromagnetic radiation; an encasing member (18) at least partially disposed around the retort (16), the encasing member (18) comprising a material that is at least partially transparent to the electromagnetic radiation; a plenum (20) defined at least in part by an inner surface (24) of the encasing member (18) and an outer surface (22) of the retort (16) ; and a furnace box (14) at least partially disposed around the encasing member (18) and the retort (16), and housing the heating element (12).
Dalakos George Theodore
Lewis Daniel Joseph
Lou Victor Lienkong
Rucker Michael Howard
Saylor Matthew David
Company General Electric
Craig Wilson And Company
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