Chemical vapor deposition apparatus and process

Details Chemical vapor deposition apparatus and process Chemical vapor deposition apparatus and process

C - Chemistry, Metallurgy

23

C

32/24

C23C 8/00 (2006.01) C23C 16/48 (2006.01)

Patent

CA 1196777

Abstract of the Disclosure A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.

435134

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