Chemical vapor deposition apparatus for forming thin film

Details Chemical vapor deposition apparatus for forming thin film Chemical vapor deposition apparatus for forming thin film

C - Chemistry, Metallurgy

23

C

204/182, 148/21,

C23C 16/46 (2006.01) C23C 16/52 (2006.01) C23C 16/54 (2006.01)

Patent

CA 2023684

ABSTRACT OF THE DISCLOSURE An apparatus for forming, by a chemical vapor deposition process, a thin film of crystals such as diamond on a surface of a heated substrate placed in a reaction vessel. The apparatus has a substrate supporting structure, a heater for heating the substrate by heat conduction or by electric current supplied directly to the substrate, and a cooling device for cooling the substrate. The heater is controlled in accordance with the measured temperature of the substrate so as to accurately maintain the substrate temperature at a constant level.

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