Chemical vapor deposition method of producing fluorine-doped...

Details Chemical vapor deposition method of producing fluorine-doped... Chemical vapor deposition method of producing fluorine-doped...

C - Chemistry, Metallurgy

23

C

117/85

C23C 16/40 (2006.01) C03C 17/245 (2006.01) C23C 16/02 (2006.01)

Patent

CA 1261686

IMPROVED CHEMICAL VAPOR DEPOSITION METHOD OF PRODUCING FLUORINE-DOPED TIN OXIDE COATINGS ABSTRACT OF THE DISCLOSURE In accordance with the invention, there is provided herein an improved chemical vapor deposition method for forming fluorine-doped tin oxide coatings using a liquid coating composition which includes a reactive organic fluorine dopant and an organotin compound. The method is carried out under a defined set of process conditions such that the coating produced has a minimum and constant sheet resistance which is substantially independent of deposition temperature. -i-

498567

Affiliated with

Also associated with

Rating

Chemical vapor deposition method of producing fluorine-doped... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vapor deposition method of producing fluorine-doped..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition method of producing fluorine-doped... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1228606