C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
148/2.1
C23C 16/40 (2006.01)
Patent
CA 902469
Rathindra N. Ghoshtagore
Robert F. Yut
LandOfFree
Chemical vapor deposition of dielectric thin films of rutile does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chemical vapor deposition of dielectric thin films of rutile, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition of dielectric thin films of rutile will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-882490