Chemical vapor deposition of metal compound coatings...

Details Chemical vapor deposition of metal compound coatings... Chemical vapor deposition of metal compound coatings...

C - Chemistry, Metallurgy

23

C

32/23, 117/81

C23C 16/34 (2006.01)

Patent

CA 1224091

ABSTRACT A process for the chemical vapor deposition on sub- strates of coatings comprising compounds of a titanium sub-group of metals, the vanadium sub-group of metals and the chromium sub-group of metals at temperatures in the range of 250°C. to 850°C. is disclosed. Sub-halides, such as TiCl3, are reacted with N2 and H2 and thermodynamic and kinetic parameters are manipulated by flow rates and partial pressures of the reactants to achieve the deposition reac- tion in the temperature range of 250°C. to 850°C. An apparatus for performing the process is also disclosed.

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