Chemical vapour deposition method to produce an electronic...

Details Chemical vapour deposition method to produce an electronic... Chemical vapour deposition method to produce an electronic...

H - Electricity

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356/179

H01L 31/18 (2006.01) C23C 16/452 (2006.01) C23C 16/48 (2006.01) G03G 5/082 (2006.01) H01L 21/205 (2006.01) H01L 29/78 (2006.01) H01L 31/075 (2006.01) H01L 31/08 (2006.01) H01L 31/20 (2006.01)

Patent

CA 1257403

- 36 - ABSTRACT OF THE DISCLOSURE A method for producing an electronic device having a multi-layer structure comprising one or more semiconductor thin layers controlled in valence electron formed on a substrate comprises forming at least one of said semiconductor thin layers controlled in valence electron according to the photo CVD method and forming at least one of other constituent layers according to the method comprising introducing a gaseous starting material for formation of a deposited film and a gaseous halogenic oxidizing agent having the property of oxidation action for said starting material into a reaction space to effect chemical contact therebetween to thereby form a plural number of precursors containing a precursor in an excited state and transferring at least one precursor of those precursors into a film forming space communicated with the reaction space as a feeding source for the constituent element of the deposited film.

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