C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 5/02 (2006.01) C07C 29/143 (2006.01) C07C 209/52 (2006.01) C07D 491/04 (2006.01) C07D 491/056 (2006.01)
Patent
CA 2257678
Chiral organoboranes of general formulae (I) and (II), wherein each of R¿1? and R¿2?, which are the same or different, is a hydrogen atom or an alkyl or cycloalkyl radical, or R¿1? and R¿2?, taken together, are a saturated divalent hydrocarbon grouping; X¿1? is a hydrogen atom; and X¿2? is a hydrogen or halogen atom; are disclosed. Methods for preparing such compounds, and the use thereof, particularly as an asymmetrical reducing agent, are also disclosed.
L'invention concerne des organoboranes chiraux de formules générales (I et II) dans lesquelles soit R1 et R2 représentent, indépendamment, un atome d'hydrogène ou un radical alkyle ou cycloalkyle, soit R1 et R2 représentent ensemble un groupement hydrocarboné divalent saturé; X1 représente un atome d'halogène; et X2 représente un atome d'hydrogène ou d'halogène. L'invention concerne également des procédés pour leur préparation et leur utilisation notamment en tant qu'agent de réduction asymétrique.
Bonato Marc
Cazaux Jean-Bernard
Follet Michel
Kamenka Jean-Marc
Goudreau Gage Dubuc
Societe D'expansion Scientifique Expansia
LandOfFree
Chiral organoboranes does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chiral organoboranes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chiral organoboranes will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1413074