Cinnamic acid derivative

Details Cinnamic acid derivative Cinnamic acid derivative

C - Chemistry, Metallurgy

07

K

C07K 5/04 (2006.01) C07C 217/08 (2006.01) C07C 219/10 (2006.01) C07C 229/22 (2006.01) C07C 233/51 (2006.01) C07C 237/08 (2006.01) C07C 237/12 (2006.01) C07K 5/06 (2006.01) C07K 5/083 (2006.01) C07K 7/04 (2006.01) C08B 37/00 (2006.01) C08B 37/08 (2006.01) C08F 8/00 (2006.01) C08G 83/00 (2006.01)

Patent

CA 2162957

The invention provides a cinnamic acid derivative having a novel spacer introduced into cinnamic acid which is photodimerizable, a cinnamic acid-polymer derivative photocurable with high sensitivity and efficiency obtainable by introducing the above cinnamic acid derivative into a host polymer such as a glycosaminoglycan, and a photocrosslinked cinnamic acid-polymer derivative obtainable by exposing the same cinnamic aicd-polymer derivative to ultraviolet light irradiation.

Cette invention procure un dérivé d'acide cinnamique dans lequel un nouvel espaceur photodimérisable est introduit, un dérivé d'acide cinnamique polymérique photodurcissable possédant une sensibilité et une efficacité élevées que l'on peut obtenir en incorporant le dérivé d'acide cinnamique indiqué précédemment dans un polymère hôte tel qu'un glycosaminoglycane, et un dérivé d'acide cinnamique polymérique photoréticulé que l'on peut obtenir par exposition de ce même dérivé d'acide cinnamique polymérique à un rayonnement ultraviolet.

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