Class of e-beam resists based on conducting organic charge...

Details Class of e-beam resists based on conducting organic charge... Class of e-beam resists based on conducting organic charge...

G - Physics

03

C

96/150, 260/195

G03C 1/72 (2006.01) G03C 5/04 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01) G03F 7/039 (2006.01)

Patent

CA 1165761

ABSTRACT Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.

354062

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