Class of e-beam resists based on donor polymer-doped...

Details Class of e-beam resists based on donor polymer-doped... Class of e-beam resists based on donor polymer-doped...

G - Physics

03

D

314/43.4

G03D 7/00 (2006.01)

Patent

CA 1163671

Abstract A new class of E-beam resists is described. The resists are donor polymer-doped halocarbon acceptor transfer complexes. They are prepared from known polymeric back- bones such as polyvinylchloride, polyglutamic acid, polyvinylbenzylchloxide, polyepichlorohydrin, poly(ahalo- phosphazenes), polyacrylic chloride, polystyrene and the like; and donor molecules such as tetrathiafulvalenes, tetraselenafulvalenes, dithiadiselenafulvalene, ferro- cenes, phenothiazines, pyrazoline and an amine having the general formula R-NH2 where R can be selected from alkyl and aryl groups. A lithographic method is also described.

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