Class of photo resists based on donor polymer-doped...

Details Class of photo resists based on donor polymer-doped... Class of photo resists based on donor polymer-doped...

G - Physics

03

F

96/152, 402/2, 4

G03F 7/26 (2006.01) G03C 1/00 (2006.01) G03C 5/16 (2006.01)

Patent

CA 1175990

ABSTRACT A new class of phot resists is described. The resists are donor polymer-doped halcarbon acceptor transfer complexes. They are prepared from know polymeric backbones such as polyvinylchloride, polyglutamic acid, polyvinylbenzylchloxide, polyepichlorohydrin, poly(.alpha.halophosphazenes), polyacrylic chloride, polystyrene and the like; and donor molecules such as tetrathiafulvalenes, tetraselenafulvalenes, dithiadiselenafulvalene, ferrocenes, phenothiazines, pyrazoline and an amine having the general formula R-NH2 where R can be selected from alkyl and aryl groups. A lithographic method is also described.

358894

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