Class of x-ray resists based on donor polymer-doped...

Details Class of x-ray resists based on donor polymer-doped... Class of x-ray resists based on donor polymer-doped...

G - Physics

03

C

96/152, 402/2, 9

G03C 5/00 (2006.01) G03C 5/16 (2006.01) H01L 21/302 (2006.01)

Patent

CA 1161685

ABSTRACT new class of X-ray resists are described. The resists are donor polymer-doped halocarbon acceptor transfer complexes. They are prepared from known polymeric backbones such as polyvinylchloride, polyglutamic acid, polyvinylbenzylchloride, polyepichlorohydrin, poly(.alpha.halophosphazenes), polyacrylic chloride, polystyrene and the like, and donor molecules such as tetrathiafulvalenes, tetraselenafulvalenes, dithiadiselenafulvalene, ferrocenes, phenothiazines, pyrazoline and an amine having the general formula R-NH2 where R can be selected from alkyl and aryl groups. A lithographic method is also described.

358898

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