C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 17/00 (2006.01) C11D 1/12 (2006.01) C11D 3/10 (2006.01) C11D 3/20 (2006.01) C11D 17/04 (2006.01)
Patent
CA 2120672
ABSTRACT A cleaning composition and method for use, comprising molded wafer of citric acid and sodium bicarbonate compressed together in an amount effective to give a compaction sufficient to produce effervescence for at least 15 minutes. The citric acid ranges from about 10% to about 30% and preferably about 18% to about 24% by weight of the weight of the formulation. The sodium bicarbonate ranges from about 35% to about 55% and preferably from 40% to about 44% by weight of the total weight. It includes a quantity of anionic detergent comprising at least about 18% by weight of the total weight of said composition, admixed into said compressed wafer prior to formation of said wafer in an amount sufficient to form a detergent solution in water. Preferably, the surfactant comprises about 6% to 10% of sodium lauryl sulfate, about 12% to 18% of alkyl aryl sulfonate, and about 4% to 6% of tetra sodium ethylene diamine tetra acetic acid. Also included is a quantity of mold release to permit easy release of the wafer after compression. The mold release comprises about 3% to 7% of silica by weight of the total weight of the formulation. The wafer is packaged in an outer package sealingly protecting the wafer from air and moisture until the package is opened for use.
Borden Ladner Gervais Llp
Lockhart Ronald R.
LandOfFree
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